要求2012年毕业的同学,工作地点在上海,需要自行解决住宿问题,表现优秀可通过校园招聘转正。
感兴趣请发送简历至monlin@nvidia.com
Job Title: Mask Layout Design Intern
Location: China, Shanghai
Department: GPU
Job Description:
This position’s responsibilities will focus on custom layout design in 28nm, 20nm, or below process; Layout quality control and verification; Layout version control and release. Main projects include compiled RAM cells and STD cells with various infrastructures. You will work with highly talented, experienced and dedicated designers both in China and America
Requirement:
BS or above in Electronics, Microelectronics or related fields
Basic knowledge of semiconductor physics and mask layout design
Good working knowledge of Unix required
Good command of written and spoken English
Rich imagination in tri-dimensional graphics--(plus)
Experience of using common industry standard tools likes Virtuoso, Hercules/Calibre--(plus)
Be familiar with schematic driven layout concept and constraints--(plus)
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FROM 203.18.50.*