Computational Lithography

Author(s):
Xu Ma, Gonzalo R. Arce
First published:
23 August 2010
Print ISBN:
9780470596975 |
Online ISBN:
9780470618943 |
DOI:
10.1002/9780470618943
Copyright (C) 2010 John Wiley & Sons, Inc.

About this book

A Unified Summary of the Models and Optimization Methods Used in Computational Lithography

Optical lithography is one of the most challenging areas of current integrated circuit manufacturing technology. The semiconductor industry is relying more on resolution enhancement techniques (RETs), since their implementation does not require significant changes in fabrication infrastructure. Computational Lithography is the first book to address the computational optimization of RETs in optical lithography, providing an in-depth discussion of optimal optical proximity correction (OPC), phase shifting mask (PSM), and off-axis illumination (OAI) RET tools that use model-based mathematical optimization approaches.


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