北京一半导体公司急聘一名设备及工艺设计工程师，实习、兼职或全职均可，待遇从优。
如果有兴趣，请将简历发至daniel.z.tang@gmail.com


职位简述：
1.使用数值模拟方法对半导体CVD/MOCVD设备进行结构设计及优化；
2. 使用数值模拟方法对化合物半导体外延薄膜的生长过程的机制进行设计及优化；
3. 协同设备工程师和工艺工程师对CVD/MOCVD设备进行硬件和软件升级。
4.完成试验仿真工作，并撰写研究报告。

Job Description:
1. Perform geometry design and optimization on semiconductor CVD/MOCVD equipment by using numerical simulations;
2. Perform epitaxy process design and optimization based on physical mechanism of epi-layer growth of compound semiconductor using CVD equipments;
3. Team with equipment engineers and process engineers to design state of the art CVD equipment and epi process, and do hardware/software upgrade on existing CVD equipments.

任职条件：
1. 教育背景：机电/微电子、机械、热能、力学、半导体材料、化学及物理等相关专业，具有流体力学、传热等专业的坚实基础，完成过流动、传热或表面化学反应过程的
研究项目；
2. 工作经验：具有对薄膜外延设备及工艺进行电磁场、流场及温度场耦合物理建模的经验；有对CVD/MOCVD设备及工艺数值模拟的经验优先。

Qualifications:
1.  Education background: electrical/micro-electronics, mechanical engineering, thermal engineering, mechanics, semiconductor materials, chemistry or physics, and other related major,
2. Working experiences: experiences of physical modeling on thin film equipment and epitaxy process by coupled simulating EM, fluid, and temperature fields. Prior practical experience of physical modeling CVD/ MOCVD is preferred.


知识/技能：
1. 对化学气相沉积设备有基本的了解；
2. 熟悉运用Ansys，Fluent或相关软件进行流场，温度场，以及化学反应沉积过程进行数值模拟及优化；
3. 熟练运用专业技术软件：MatLab, CAD等其他与半导体设备及工艺设计相关的软件和通用办公软件。

Knowledge/Skills:
1. Understand the basic theory of CVD equipments.
2. Be familiar with Ansys,Fluent, or other related software tools to simulate and optimize fluid mechanics, temperature distribution, and chemical reactions on solid/gas interfaces in CVD reactors.
3. Skilled in using MatLab, CAD and other related technical software and general office software for semiconductor equipment and process design.
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修改:gorf FROM 114.250.86.*
FROM 114.246.176.*